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Dipping and lifting coating machine / lifting machine model; MHY-20001
1. Product Application
This product is mainly used for preparing thin film materials by sol-gel method and other liquid phase methods. Immerse the clean and dry substrate in the solution, through the preset immersion time, pulling speed, pulling height, coating times and other parameters, slowly pull the immersed substrate at a certain speed, on the surface of the substrate Form a layer of nano-scale film. The thickness of the film layer is determined by the pulling speed, liquid concentration and liquid viscosity.
The sol-gel method is used to coat the film. As the substrate is pulled out of the sol, a film is attached to the substrate, called a "wet gel film". The film layer is cured on the substrate to become a "xerogel film". "Dry gel film" after further drying and high temperature heat treatment will get the required nano-thin film material.
2. Product Introduction
The dipping and pulling coating machine is specially designed for the research work of preparing thin film materials in the liquid phase (especially the sol-gel method), and the film is grown by dipping and pulling different liquids. Lifting speed, lifting height, dipping time, coating times (multiple multi-layer coatings), and coating interval are all continuously adjustable and precisely controlled. There is no special requirement for the coating substrate, and the film, block, cylinder, etc. can be coated. Stable operation and no vibration of the liquid surface during work can greatly improve the accuracy and efficiency of the experiment.
It is suitable for the surface coating process of all solid materials such as silicon wafers, wafers, glass, ceramics and metals. Used in scientific research and product production.
3. Product Features
1. Adopt advanced C4 precision transmission device;
2. The key parts are imported from Taiwan and Japan;
3. Multi-parameter fully automatic control; the pulling speed is continuously adjustable;
4. 4.3 inch LCD touch screen makes the control more convenient;
5. Both high and low speeds run smoothly without vibration, making the film formation more uniform;
4. Technical parameters
. Lifting speed range: 1 ~ 6000 μm / s, minimum resolution 1μm / s;
2. Speed accuracy: -0.02% ~ + 0.02%;
3. Maximum stroke: about 200 mm;
4. Coatable substrate size: MIN 10 × 10 mm, MAX 100 × 100 mm, thickness MAX 10mm;
5. Immersion time: 1 ~ 3600 s, minimum resolution 1s;
6. Cycle coating times: 1 to 1000 times, at least 1 time;
7. Interval time of circulating coating: 1 ~ 3600 s, minimum resolution 1s;
8. Power supply: 220V / 50Hz;
October 14, 2024
September 27, 2024
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October 14, 2024
September 27, 2024
October 31, 2024
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Privacy statement: Your privacy is very important to Us. Our company promises not to disclose your personal information to any external company with out your explicit permission.